Mumbai University > Electronics Engineering > Sem 8 > MEMS Technology

Marks: 5M

Three principal silicon compounds used in MEMS and microsystems.

1.Silicon dioxide [$sio_2$]

2.Silicon carbide [siC]

3.Silicon nitride [$si_3 N_4$]

1. Silicon dioxide [si$o_2$] :

• It is least expensive material to offer good thermal and electrical insulation.

• It is used as low cost material for "masks" in micro fabrication processes such as etching, deposition and diffusion.

• Used as sacrificial material in "surface micro-machining".

2. Silicon Carbide [siC] :

• Its very high melting point and resistance to chemical reactions make it ideal candidate material for being masks in micro fabrication processes.

3. Silicon nitride [s$i_3$$N_4$]

• Used as excellent barrier to diffusion to water and ions.

• Its ultra strong resistance to oxidation and many etchants make it a superior material for masks in deep etching.

• It is used as high strength electric insulators.