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Justify the need of vacuum pressure in Physical Vapor Deposition (PVD). Explain in brief any one of the techniques of PVD for MEMS device fabrication. Also define the terms step coverage and shadowing
written 6.1 years ago by gravatar for teamques10 teamques10 ★ 69k •   modified 6.1 years ago

Mumbai University > Electronics Engineering > Sem 8 > MEMS Technology

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mems technology
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written 6.1 years ago by gravatar for teamques10 teamques10 ★ 69k •   modified 6.0 years ago

  • Physical vapor deposition [PVD] describes a variety of vacuum deposition methods which can be used to produce thin films and coatings.

  • PVD is characterized by a process in which the material goes from a condensed phase to a vapor phase and then back to a thin film condensed phase.

  • The …

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