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Explain pre-deposition and drive-in steps in diffusion process.
1 Answer
written 6.5 years ago by |
Pre-deposition:
Pre-deposition is also known as constant source diffusion.
In IC processing a two-step diffusion process is commonly used in which pre-deposition diffused layer is first formed under the constant surface concentration condition.
Here surface concentration of dopant is always constant.
It is given by complementary error function.
$N(x,t)=N_0 erfc …