and 5 others joined a min ago.
0
6.3kviews
Describe APCVD process with neat diagram. Why wafers are lying horizontal in this process? Enlist drawbacks of this process.
1 Answer
0
545views
written 6.5 years ago by
teamques10
★ 69k
|
The important distinctions between the different CVD techniques are the amount of pressure required in the reaction chamber and the energy source.
An atmospheric pressure chemical vapor deposition (APCVD) system uses atmospheric pressure or 1 atm in the reaction chamber.
A “cold Wall reactor” is used in this process. Only …
and 4 others joined a min ago.
ADD COMMENT
EDIT
Please log in to add an answer.