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In n-channel E-MOSFET

Mumbai University > Electronics ana telecommunication engineering > Sem 3 > Analog electronics 1

Marks: 10M

Years: Dec 14

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1.Substrate doping Na=1016cm3

2.Polysilicon Gae doping Nd=1020cm3

3.Gate oxide thickness tox = 0.5 μm

4.Oxide positive charge interface density = 4x1010cm2

5.Charge of electron1.6x1019col

6.Permittivity of free space ϵ̥= 8.85x1014F/cm.

7.Dielectric constant of Si =11.9

8.Dielectric constant …

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