written 8.3 years ago by | modified 8.3 years ago by |
Mumbai University > Electronics Engineering > Sem 8 > MEMS Technology
Marks: 3M
written 8.3 years ago by | modified 8.3 years ago by |
Mumbai University > Electronics Engineering > Sem 8 > MEMS Technology
Marks: 3M
written 8.3 years ago by |
Design for test is an important responsibility of design engineers for MEMS and microsystems
Following major tasks are involved:
Design for testing
Performance tests:
Parametric Testing
Example 1: The van der Pauw sheet resistance test structure.
Pass current to pad 2 & 3
Measure voltage across pad 1 & 4
The surface resistance in the area is:
$R_c = \frac{V_{1.4}}{I_{2.3}}$
Example 2: Parametric test structures for measuring tensile strain.
The compressive strain responsible for the bucking of the thin beam is:
$L_c = \sqrt{\frac{t^2 \pi^2}{3 \epsilon}}$ where $L_c$ = length of the beam, t= thickness
Example 3: Parametric test structure for measuring both tensile and compressive strains.
Beam electrodes are connected and anchored on the workpiece at shallow angles.
Associated tensile or compressive strains can be correlated to the measured capacitances from these beam electrodes.
Example 4: Parametric test structure using resonator for monitoring surface stresses.
Testing during Assembly:
For two purposes:
Example 1: Texas instruments digital micromirror device with 0.5 to 1.5 million electrostatically actuated mirrors at 16µm * 16µm